20 August 1986 A Glimpse Into The Future Of Optical Lithography
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Abstract
The conference papers relating to resolution and overlay of exploratory but production-worthy exposure/alignment systems indicate performance far exceeding current IC manufacturing demands, and hence give a glimpse of future production systems and design rules. A summary table is presented.
© (1986) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Harry L. Stover, "A Glimpse Into The Future Of Optical Lithography", Proc. SPIE 0633, Optical Microlithography V, (20 August 1986); doi: 10.1117/12.963696; https://doi.org/10.1117/12.963696
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