20 August 1986 Clear Defect Photolithographic Mask Repair In Open Air Using Laser-Induced Pyrolytic Decomposition
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Abstract
We are describing a visible wavelength laser driven pyrolytic decomposition of metal carbonyls. Micrometer resolution deposits generated by this process are used to repair clear defects (missing chrome) on photolithographic masks. The process takes place in an open air environment with partial atmosphere control achieved by supply gas flow and venting arrangements. Writing speeds of 5 micrometer per second are achieved with room temperature operation.
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Zbigniew Drozdowicz, Joel Bornstein, John O'Connor, "Clear Defect Photolithographic Mask Repair In Open Air Using Laser-Induced Pyrolytic Decomposition", Proc. SPIE 0633, Optical Microlithography V, (20 August 1986); doi: 10.1117/12.963717; https://doi.org/10.1117/12.963717
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