20 August 1986 Electrical Methods For Precision Stepper Column Optimization
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Abstract
This paper presents a quick and accurate method for determining optical column misalignment and degree of telecentricity of a precision wafer stepper using computerized electrical techniques. The trend toward increasingly difficult device design rules has driven the present demand for ultimate stepper performance, which requires the optimization of column alignment and telecentricity, along with the routine monitoring of standard parameters including translation, rotation, magnification, trapezoid and distortion. Device designs using a full-lens field and requiring complex processing, involving large topographical steps, are especially demanding.
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Ludwik J. Zych, Ludwik J. Zych, Gianpaolo Spadini, Gianpaolo Spadini, Talat F. Hasan, Talat F. Hasan, Beth A. Arden, Beth A. Arden, } "Electrical Methods For Precision Stepper Column Optimization", Proc. SPIE 0633, Optical Microlithography V, (20 August 1986); doi: 10.1117/12.963708; https://doi.org/10.1117/12.963708
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