20 August 1986 STARR: Stepper Test Alignment Resolution Reticle For The Lithographic Characterization Of A Sub-Micron Stepper
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Proceedings Volume 0633, Optical Microlithography V; (1986); doi: 10.1117/12.963735
Event: 1986 Microlithography Conferences, 1986, Santa Clara, United States
Abstract
This paper describes the design and implementation of a custom reticle developed as part of a sub-micron stepper evaluation program. The 5X reticle was designed so that all major commercially available steppers could be directly compared. It has a unique arrangement of optical and electrical registration test structures allowing for three levels of processing which provides a true measure of the registration capabilities of a system. The reticle has a number of structures which can be used to evaluate the imaging quality of a stepper system. These include a "Focus Star" structure designed to allow easy evaluation of resolution, focus, and astigmatism, a defect structure to measure the printability of commonly seen reticle defects, and L-bar patterns. The remainder of the reticle is intended for use in analyzing other lithographic problems such as proximity effects, substrate induced reflections, step coverage, and critical dimension control.
© (1986) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Robert P. Hardin, Mark P. Gulden, "STARR: Stepper Test Alignment Resolution Reticle For The Lithographic Characterization Of A Sub-Micron Stepper", Proc. SPIE 0633, Optical Microlithography V, (20 August 1986); doi: 10.1117/12.963735; https://doi.org/10.1117/12.963735
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KEYWORDS
Reticles

Optical alignment

Lithography

Semiconducting wafers

Stars

Image registration

Monochromatic aberrations

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