25 November 1986 Detailed Model Of HF-DF Chemical Lasers
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Proceedings Volume 0642, Modeling and Simulation of Optoelectronic Systems; (1986) https://doi.org/10.1117/12.975476
Event: 1986 Technical Symposium Southeast, 1986, Orlando, United States
Abstract
A model of HF-DF chemical lasers which includes a wave optics treatment of the resonator, a flowing gain medium, all important gas phase kinetics processes, and rotational non-equilibrium is discussed. The effects of rotational cross-relaxation rate on the predicted spectra for both stable and unstable resonators are shown, as well as the interaction of this effect with the placement of the resonator optical axis within the mode. The effect of partial aperture lasing and means for its suppression using cross-relaxation rate and/or optical axis placement are discussed. Some comparison with experiment is presented.
© (1986) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
D. L. Bullock, D. L. Bullock, M. M. Valley, M. M. Valley, R. J. Wagner, R. J. Wagner, M. E. Lainhart, M. E. Lainhart, R. S. Margulies, R. S. Margulies, } "Detailed Model Of HF-DF Chemical Lasers", Proc. SPIE 0642, Modeling and Simulation of Optoelectronic Systems, (25 November 1986); doi: 10.1117/12.975476; https://doi.org/10.1117/12.975476
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