13 October 1986 Computer Simulation Of Evaporation Processes
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Proceedings Volume 0652, Thin Film Technologies II; (1986) https://doi.org/10.1117/12.938398
Event: 1986 International Symposium/Innsbruck, 1986, Innsbruck, Austria
Abstract
We present an algorithm for the computer simulation of evaporation processes and a method to characterize the emission patterns of the evaporation sources. The parameters taken into account on the algorithm, describe the geometry of the evaporation chamber, detectors, substrate and substrate holder, as well as the kinematics of the planetary or calotte. The numerical algorithm produces the appropriate parameters for the optical and quartz detectors to be fed to the controler during authomatic production runs. The characterization of the emission patterns of the sources is achieved through the study of the monochromatic transmission bands on a series of multilayer Fabry-Perot filters. These patterns are modi-fied by an orthonormal polynomial series expansion. The polynomials are determined by extensive data reduction of the film taper-thickness as a function of position. The large circular flat glass substrates used, were kept static during the process of evaporation in order to obtain the specific thickness distribution for each type of source. Experimental results are compared to the computer simulations.
© (1986) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Ricardo Flores-Hernandez, Ricardo Flores-Hernandez, } "Computer Simulation Of Evaporation Processes", Proc. SPIE 0652, Thin Film Technologies II, (13 October 1986); doi: 10.1117/12.938398; https://doi.org/10.1117/12.938398
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