Optical Constants Of Thin Silver And Titanium Nitride Films

E. Valkonen; C G Ribbing; J E Sundgren

doi:10.1117/12.938385

13 October 1986 Optical Constants Of Thin Silver And Titanium Nitride Films

E. Valkonen, C G Ribbing, J E Sundgren

Proceedings Volume 0652, Thin Film Technologies II; (1986) https://doi.org/10.1117/12.938385
Event: 1986 International Symposium/Innsbruck, 1986, Innsbruck, Austria

Abstract

The optical constants of thin films of silver and titanium nitride have been obtained in the visible and near infrared spectral regions by the Nestell-Christy method. The silver films, 9-.27 nm thick, were prepared by d.c. magnetron sputtering at low pressures. It is found that the silver films, prepared at sputtering pressures below 2 mTorr, retain their bulk optical constants down to 13 nm film thickness. 5- 31 nm thick TiN films were depos-ited by reactive d.c. magnetron sputtering on 4000C heated glass substrates. The substrate heating increased the IR reflectance of the film with preserved transmittance. The free-electron character of the thin TiN films is maintained in the thickness range 13- 31 nm, as is plain from the behaviour of the optical constants. A common observation for the Ag- and TiN-films is that a low refractive index in the visible is a more sensitive criterion on film quality than the extinction coefficient. From the Drude analysis in the infrared spectral region the free-electron plasma energies and relaxation times have been derived and comparison with previous data have been made. The present results are of interest for heat-mirror development and the performance parameters for such applications are calculated and discussed.

Citation Download Citation

E. Valkonen, C G Ribbing, and J E Sundgren "Optical Constants Of Thin Silver And Titanium Nitride Films", Proc. SPIE 0652, Thin Film Technologies II, (13 October 1986); https://doi.org/10.1117/12.938385

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