13 October 1986 Optimization Of Technology For The Systems Of Hard-Oxide Layers By Spectroscopic Methods
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Proceedings Volume 0652, Thin Film Technologies II; (1986) https://doi.org/10.1117/12.938394
Event: 1986 International Symposium/Innsbruck, 1986, Innsbruck, Austria
Abstract
The well-known evaporating process of hard-oxid coatings for laser mirrors has many uncontrolled parameters. This paper deals with the Ti0,-SiO2 hard-oxides systems. The optimization of technology is based on optical [transmission; reflection parameters etc), spectroscopical [soft x-ray emission spectroscopy /SXES/, x-ray fluorescence spectroscopy /XFS/], structural (x-ray diffraction /XRD/) and damage threshold /DT/ examinations. The Ti02 was found in the evaporated layers in two equilibrium phases - rutil and anatase - depending on the evapora-tion conditions. The rutil phase was better than the anatase considering the DT for mirrors at λ=]1064 µm. The explanation is based on the difference of the near-infrared absorbtion between rutil and anatase phase of Ti02.
© (1986) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
K Fluck, G Szalai, J Kojnok, A Szasz, "Optimization Of Technology For The Systems Of Hard-Oxide Layers By Spectroscopic Methods", Proc. SPIE 0652, Thin Film Technologies II, (13 October 1986); doi: 10.1117/12.938394; https://doi.org/10.1117/12.938394
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