Thin Film Production With A New Fully Automated Optical Thickness Monitoring System

M Lardon; H Selhofer

doi:10.1117/12.938351

13 October 1986 Thin Film Production With A New Fully Automated Optical Thickness Monitoring System

M Lardon, H Selhofer

Proceedings Volume 0652, Thin Film Technologies II; (1986) https://doi.org/10.1117/12.938351
Event: 1986 International Symposium/Innsbruck, 1986, Innsbruck, Austria

Abstract

The increasing demand for complex multilayer optical coatings requires equipment with a completely automated process control system. The new optical thickness monitor GSM 420, which is part of the deposition control system BPU 420 allows the remotely controlled wave-length selection either with a grating monochromator combined with the appropriate order sorting filters or with a set of six narrow bandpass filters. The endpoint detection is based on the digital processing of the signal corresponding to the light intensity after transmission through or reflexion from a testglass located side by side with a quartz crystal microbalance at the center of the coating plant. Turning value monitoring or termination of the process at an arbitrary predetermined point are both possible. Single and multiple layers of silicon dioxide and titanium dioxide and combinations thereof were deposited. Excellent linear correlation between the optical thickness on the test glass and the geometrical layer thickness as measured by the quartz crystal microbalance was observed. The reproducibility for single layers of quarterwave thickness was found to be between ± 0.7 to ± 1.7 % of the center wavelength of the spectral extremum measured on the test glass, depending on wavelength (350 - 3200 nm) and coating material (SiO₂ or TiO₂ on glass).

Citation Download Citation

M Lardon and H Selhofer "Thin Film Production With A New Fully Automated Optical Thickness Monitoring System", Proc. SPIE 0652, Thin Film Technologies II, (13 October 1986); https://doi.org/10.1117/12.938351

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