13 October 1986 Total Integrated Scatter Measurement System For Quality Assessment Of Coatings On Optical Surfaces
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Proceedings Volume 0652, Thin Film Technologies II; (1986) https://doi.org/10.1117/12.938389
Event: 1986 International Symposium/Innsbruck, 1986, Innsbruck, Austria
Abstract
Total integrated scatter (TIS) measurements are discussed on the basis of the proposed ASTM standard for surface characterization. A TIS-apparatus built in accordance with this standard is presented and measurements are reported for samples ranging in roughness from 1 A to 150 A. Si-wafers are demonstrated to possess excellent surface quality and made measurements of roughness from an 1100 A Al-film possible.
© (1986) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Lars Mattsson, Lars Mattsson, } "Total Integrated Scatter Measurement System For Quality Assessment Of Coatings On Optical Surfaces", Proc. SPIE 0652, Thin Film Technologies II, (13 October 1986); doi: 10.1117/12.938389; https://doi.org/10.1117/12.938389
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