15 January 1988 Development Of High Resolution Zone Plate By Holography And Ion-Etching Techniques
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Proceedings Volume 0673, Holography Applications; (1988) https://doi.org/10.1117/12.939105
Event: Holography Applications, 1986, Beijing, China
Abstract
The purpose of development and the processing steps to fabricate high resolution zone plates, especially holographic exposure and ion-etching, are described. Also the experimental results and some prospects are presented.
© (1988) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Yong-Gang Su, Shao-Jun Fu, Xiao-Min Tao, Yi-Lin Hong, Yun-Wu Zhang, "Development Of High Resolution Zone Plate By Holography And Ion-Etching Techniques", Proc. SPIE 0673, Holography Applications, (15 January 1988); doi: 10.1117/12.939105; https://doi.org/10.1117/12.939105
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