15 January 1988 Hologram Interferometer For Film Deposits Evaluation
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Proceedings Volume 0673, Holography Applications; (1988) https://doi.org/10.1117/12.939055
Event: Holography Applications, 1986, Beijing, China
The design and performance of a holographic interferometer for the assessment of thin film deposits made on dielectric substrates is presented. Thickness and uniformity of film deposits thicker than 1 micron can be evaluated with this device. This interferometer can also be used in a reflection mode to test non-dielectric deposits made on opaque substrates.
© (1988) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Diana Tentori, Martin Celaya, "Hologram Interferometer For Film Deposits Evaluation", Proc. SPIE 0673, Holography Applications, (15 January 1988); doi: 10.1117/12.939055; https://doi.org/10.1117/12.939055

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