15 January 1988 Making CGH By Using Electron Beam
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Proceedings Volume 0673, Holography Applications; (1988) https://doi.org/10.1117/12.939045
Event: Holography Applications, 1986, Beijing, China
The Electron-beam Lithography is a newly developed microfabrication technique. The principle and technology of making CGH by E-beam were discussed. The influences of error on the E-beam Generated Holograms have been analysed. The experimental results of the differential filters and a CGH scatter-plate have also been presented.
© (1988) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Yan Yingbai, Yu Dongxiao, Chin kuo-fan, "Making CGH By Using Electron Beam", Proc. SPIE 0673, Holography Applications, (15 January 1988); doi: 10.1117/12.939045; https://doi.org/10.1117/12.939045

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