3 June 1987 An Analytical Technique For Predicting The Effect Of Particle Contamination On Direct Scatter In An Optical Sensor
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Abstract
A systems level analysis technique has been developed for predicting the direct solar scatter in the focal plane of an optical sensor due to particle deposition on critical surfaces. The technique consists of: 1) developing a simplified scattering model for predicting the baseline sensor performance, 2) developing predictions of the surface cleanliness levels of critical sensor optical surfaces based on the expected exposure to a specified contamination environment, 3) developing the particle scattering functions for the critical sensor surfaces using a geometrical scattering model, and 4) combining the particle scattering functions with the system model and predicting the contaminated system performance. This paper describes this process using a typical Cassegrain sensor as a sample demonstration case. The particle scattering model is developed and compared to measured particle scattering functions. The system scattering model is developed and compared to system scattering test data. Surface cleanliness levels are predicted based on facility particle fallout test data for a standard sensor assembly and test timeline. The facility fallout data are calculated at sensitive surface locations using a full-scale mockup of the sensor. The overall sensor performance is predicted for the clean and contaminated system based on the total scattered power incident on the sensor detector.
© (1987) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Frank J Jarossy, Larry W Mason, "An Analytical Technique For Predicting The Effect Of Particle Contamination On Direct Scatter In An Optical Sensor", Proc. SPIE 0675, Stray Radiation V, (3 June 1987); doi: 10.1117/12.939494; https://doi.org/10.1117/12.939494
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