Non-Polarizing Edge Filters For The Near Infrared

R Herrmann; A Thelen; W Zueltzke

doi:10.1117/12.939553

23 December 1986 Non-Polarizing Edge Filters For The Near Infrared

R Herrmann, A Thelen, W Zueltzke

Proceedings Volume 0678, Optical Thin Films II: New Developments; (1986) https://doi.org/10.1117/12.939553
Event: 30th Annual Technical Symposium, 1986, San Diego, United States

Abstract

Optical communication systems need non-polarizing edge filters for the construction of wavelength division multiplexer (WDM). We report about our investigations to produce such filters by using the material combination Si02/Si. The advantage of this combination is the high refractive index difference allowing the production of steep edges. On the other hand,the silicon layers could only be made fairly non-absorbing by depositing them onto heated substrates (300°C) and subjecting them afterwards to an additional heat treatment. So these layer systems can up to now not be deposited onto cemented optical fiber components.

Citation Download Citation

R Herrmann, A Thelen, and W Zueltzke "Non-Polarizing Edge Filters For The Near Infrared", Proc. SPIE 0678, Optical Thin Films II: New Developments, (23 December 1986); https://doi.org/10.1117/12.939553

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