9 April 1987 Fabrication and Evaluation of Mo-Si Multilayer Mirrors for Soft X-Rays
Author Affiliations +
Mo-Si multilayers were fabricated by means of ion-beam sputtering. The reflectances of Mo-Si multilayers, single layers of Mo and Si, and a glass substrate were measured for s-polarization with synchrotron radiation. The peak reflectance of the best Mo-Si multilayer was 17.5% at 13.7 nm. The optical constants of Mo, Si and BK7 glass obtained from the reflectance data are given at a wavelength region of 12nm (104eV) to 20nm (62.3eV).
© (1987) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Masaki Yamamoto, Akira Arai, Masayuki Watanabe, Takeshi Namioka, "Fabrication and Evaluation of Mo-Si Multilayer Mirrors for Soft X-Rays", Proc. SPIE 0688, Multilayer Structures & Laboratory X-Ray Laser Research, (9 April 1987); doi: 10.1117/12.964828; https://doi.org/10.1117/12.964828


Damage resistant and low-stress Si-based multilayer mirrors
Proceedings of SPIE (December 20 2001)
Multilaver Mirrors For 182
Proceedings of SPIE (July 28 1989)
Multilayer Reflectors for the 200 A Region
Proceedings of SPIE (April 09 1987)
Mo Si multilayers with enhanced TiO2 and RuO2 capping...
Proceedings of SPIE (March 20 2008)

Back to Top