9 April 1987 Fabrication and Evaluation of Mo-Si Multilayer Mirrors for Soft X-Rays
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Abstract
Mo-Si multilayers were fabricated by means of ion-beam sputtering. The reflectances of Mo-Si multilayers, single layers of Mo and Si, and a glass substrate were measured for s-polarization with synchrotron radiation. The peak reflectance of the best Mo-Si multilayer was 17.5% at 13.7 nm. The optical constants of Mo, Si and BK7 glass obtained from the reflectance data are given at a wavelength region of 12nm (104eV) to 20nm (62.3eV).
© (1987) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Masaki Yamamoto, Akira Arai, Masayuki Watanabe, Takeshi Namioka, "Fabrication and Evaluation of Mo-Si Multilayer Mirrors for Soft X-Rays", Proc. SPIE 0688, Multilayer Structures & Laboratory X-Ray Laser Research, (9 April 1987); doi: 10.1117/12.964828; https://doi.org/10.1117/12.964828
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KEYWORDS
Silicon

Molybdenum

Reflectivity

Multilayers

Glasses

Anisotropy

Oxidation

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