First Results Obtained On A Magnetron Sputtering Device Designed To Produce High Reflectivity X-UV Mirrors

B. Vidal; P. Dhez

doi:10.1117/12.964830

9 April 1987 First Results Obtained On A Magnetron Sputtering Device Designed To Produce High Reflectivity X-UV Mirrors

B. Vidal, P. Dhez

Proceedings Volume 0688, Multilayer Structures & Laboratory X-Ray Laser Research; (1987) https://doi.org/10.1117/12.964830
Event: 30th Annual Technical Symposium, 1986, San Diego, United States

Abstract

Described here is a new magnetron sputtering device which will produce high reflectivity mirrors in the X-UV spectral range. The system is designed to produce automatically each bilayer with great accuracy and with a high degree of reproducibility. The mode of operation is explained. One of the important parameters is the roughness of each interfaces which can cause significant losses in the reflectivity of such mirrors. We describe here how these defects may be reduced by changing some of the initial parameters in our sputtering coating plant. A theoretical study and experimental determination of the homogeneity of the deposition system are presented. Several methods of characterization of our samples are used. Our choice of such a modified device is discussed with respect to our objective which is to obtain a well defined interface between the two hlaterials and high reflectivity mirrors used in the X-UV range.

Citation Download Citation

B. Vidal and P. Dhez "First Results Obtained On A Magnetron Sputtering Device Designed To Produce High Reflectivity X-UV Mirrors", Proc. SPIE 0688, Multilayer Structures & Laboratory X-Ray Laser Research, (9 April 1987); https://doi.org/10.1117/12.964830

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