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9 April 1987 Multilayer Reflectors for the 200 Å Region
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Abstract
Silicon/tungsten multilayer normal-incidence mirrors with maximum reflectance at 212 Å have been designed and studied. Details of the fabrication and characterization techniques are given. Preliminary results of synchrotron measurements show agreement with calculations based on microscopic structure of these multilayers. The Si/W combination has desirable characteristics for use in X-UV or soft x-ray devices.
© (1987) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Felix E. Fernandez and Charles M. Falco "Multilayer Reflectors for the 200 Å Region", Proc. SPIE 0688, Multilayer Structures & Laboratory X-Ray Laser Research, (9 April 1987); https://doi.org/10.1117/12.964829
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