12 August 1986 Simultaneous, Nondestructive Analysis Of Thickness And Composition Of Multilayer Metal Films Using A Fundamental Parameter XRF Approach.
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Proceedings Volume 0691, X-Ray Imaging II; (1986); doi: 10.1117/12.936617
Event: 30th Annual Technical Symposium, 1986, San Diego, United States
Abstract
General algorithms have been developed for interpreting X-ray fluorescence (XRF) data from single and multilayer metal films to yield precise values for both thickness and composition. As an example, the relative precision for a replicate analysis of a multilayer Al-Ti-Cu (substrate) sample was measured to be 0.6% (lo) for a 14 micron Al layer and 2.4% (lσ) for a 65OÅR Ti underlayer. Several examples showing the rapid, nondestructive nature of the analysis will be presented.
© (1986) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
R. Linder, G. Kladnik, J. Augenstine, "Simultaneous, Nondestructive Analysis Of Thickness And Composition Of Multilayer Metal Films Using A Fundamental Parameter XRF Approach.", Proc. SPIE 0691, X-Ray Imaging II, (12 August 1986); doi: 10.1117/12.936617; https://doi.org/10.1117/12.936617
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KEYWORDS
Gold

Aluminum

Thin films

Absorption

Copper

Nickel

Multilayers

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