18 May 1987 A New Approach For Thickness Modulation Measurement From Diffraction Data For Nonlinear Recording Materials
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Proceedings Volume 0702, International Topical Meeting on Image Detection and Quality; (1987) https://doi.org/10.1117/12.966800
Event: International Topical Meeting on Image Detection and Quality, 1986, Paris, France
Abstract
A differential method based on diffraction from a low modulated holographic grating is aprlied for measuring the thickness modulation of a positive photoresist via its rate of development. Real-time measurements are performed during wet development and results are compared with simultaneously measured reflectivity interference curves.
© (1987) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
J. Frejlich, J. Frejlich, L. Cescato, L. Cescato, G. F. Mendes, G. F. Mendes, "A New Approach For Thickness Modulation Measurement From Diffraction Data For Nonlinear Recording Materials", Proc. SPIE 0702, International Topical Meeting on Image Detection and Quality, (18 May 1987); doi: 10.1117/12.966800; https://doi.org/10.1117/12.966800
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