10 March 1987 A Simple, Very High Sensitivity Method For Measurement Of Ti Films For Integrated Optics Applications In Linb03
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Proceedings Volume 0704, Integrated Optical Circuit Engineering IV; (1987) https://doi.org/10.1117/12.937151
Event: Cambridge Symposium-Fiber/LASE '86, 1986, Cambridge, MA, United States
Abstract
This paper presents an experimental investigation on the characteristics and the capabilities of optical densitometry as a low cost, easy and non destructive technique to measure Ti film thickness. Optical density yields a sensitivity and a resolution equal or better than 3 Å and can be absolutely calibrated for the total metal content at given deposition conditions.
© (1987) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
C. De Bernardi, C. De Bernardi, M. Meliga, M. Meliga, G. Meneghini, G. Meneghini, S. Morasca, S. Morasca, } "A Simple, Very High Sensitivity Method For Measurement Of Ti Films For Integrated Optics Applications In Linb03", Proc. SPIE 0704, Integrated Optical Circuit Engineering IV, (10 March 1987); doi: 10.1117/12.937151; https://doi.org/10.1117/12.937151
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