Laser damage threshold measurements in the ultraviolet' (UV) have been made at the Lawrence Livermore National Laboratory (LLNL) since 1979. These tests were conducted using single pulses at the third (355 nm) and fourth (266 nm) harmonic wavelengths of 1064-nm Nd-glass lasers, and single and repetitively fired pulses from KrF (248 nm) and XeF (351 nm) excimer lasers respectively. Surface damage thresholds of dielectric thin films, antireflective (AR) coatings, highly reflective (HP) coatings, and porous and graded-index AR coatings, as well as surface and bulk thresholds of optical windows and crystals have been measured. More than twenty different parameter studies have been conducted to develop materials with increased laser damage thresholds.
E. A. Hildum,
"Review Of Uv Laser Damage Measurements At Lawrence Livermore National Laboratory", Proc. SPIE 0710, Excimer Lasers and Optics, (11 March 1987); doi: 10.1117/12.937299; https://doi.org/10.1117/12.937299