1 January 1986 Laser Created X-Ray Sources For Microlithography
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Proceedings Volume 0733, Soft X-Ray Optics and Technology; (1986) https://doi.org/10.1117/12.964892
Event: Soft X-Ray Optics and Technology, 1987, Berlin, Germany
Abstract
Laser created X-ray sources have been investigated both theoretically and experimentally using λ = 1.06 μm and λ = 0.26 μm and short pulses (0.5 nsec). Some preliminary results are given with UV radiation obtained with a long pulse (25 nsec) excimer laser. The con-version efficiency of the X-ray emission in the sub-keV (0.1-0.75 keV) and keV (0.75-2 keV) ranges is given for various atomic numbers and a large range of laser intensities. Using these results and resist sensitivities, we discuss the characteristics of the laser required for X-ray lithography.
© (1986) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
M. Chaker, M. Chaker, H. Pepin, H. Pepin, V. Bareau, V. Bareau, S. Boily, S. Boily, B. Lafontaine, B. Lafontaine, R. Fabbro, R. Fabbro, I. Toubhans, I. Toubhans, B. Faral, B. Faral, J. F. Currie, J. F. Currie, D. Nagel, D. Nagel, M. Peckerar, M. Peckerar, } "Laser Created X-Ray Sources For Microlithography", Proc. SPIE 0733, Soft X-Ray Optics and Technology, (1 January 1986); doi: 10.1117/12.964892; https://doi.org/10.1117/12.964892
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