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1 January 1986 Normal Incidence X-UV Mirrors
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Proceedings Volume 0733, Soft X-Ray Optics and Technology; (1986) https://doi.org/10.1117/12.964930
Event: Soft X-Ray Optics and Technology, 1987, Berlin, Germany
Abstract
We describe the fabrication procedure as well as results of an extensive series of characterization measurements, model-fitting and synchrotron tests on Si/W multilayers designed as normal-incidence reflectors for -200 Å radiation. Characterization techniques used were low-angle diffraction, Bragg-Brentano and Seemann-Bohlin diffraction, Read camera, transmission electron microscopy and Rutherford backscattering spectroscopy. To our knowledge, this is the first time such a comprehensive set of characterization techniques has been applied to a multilayer x-ray mirror. Reflectances for -200 Å calculated using the results from these various characterization techniques are found to agree very well with measurements obtained with synchrotron radiation.
© (1986) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Charles M. Falco, Felix E. Fernandez, P. Dhez, A. Khandar-Shahabad, L. Nevot, B. Pardo, and J. Corno "Normal Incidence X-UV Mirrors", Proc. SPIE 0733, Soft X-Ray Optics and Technology, (1 January 1986); https://doi.org/10.1117/12.964930
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