1 January 1986 Performances Of C-W Multilayers As Soft X-Rays Optics : High Reflectivity In The Range 2d = 60 to 100 Å
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Proceedings Volume 0733, Soft X-Ray Optics and Technology; (1986) https://doi.org/10.1117/12.964935
Event: Soft X-Ray Optics and Technology, 1987, Berlin, Germany
Abstract
Diode RF sputtering technique has been used to produce carbon-tungsten ultra thin layers stacks for application in the soft X-ray domain as optical system. In situ kinetic ellipsometry has been chosen to control the multilayers growth with a great accuracy. Grazing X-ray reflection (1.54 P., absolute soft X-ray reflectivity (44.7 Å) and cross section transmission electron microscopy results confirm a posteriori the ellipsometry ones. Deposition conditions have been optimized using these characterizations. The thick-ness fluctuations are very low (0.2 % per layer). We have observed the smoothing of the layers roughness as the number of C-W sequences increases (the substrate having a roughness of 7 Å, the layers of 2 Å). We have realized multilayers in the range 2d = 60 Å and 2d = 90 Å. Their reflectivities typically reach 8 % = 45° at 44.7 Å) for the first ones and 13 % (9- = 30° at 44.7 Å) for the second ones. We have also realized stacks with a great number of layers in the range 2d = 100 A. 17 % reflectivities have been reached for a 180 layers stack.
© (1986) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Ph . Houdy, Ph . Houdy, V. Bodart, V. Bodart, C. Hily, C. Hily, P. Ruterana, P. Ruterana, L. Nevot, L. Nevot, M. Arbaoui, M. Arbaoui, N. Alehyane, N. Alehyane, R. Barchewitz, R. Barchewitz, } "Performances Of C-W Multilayers As Soft X-Rays Optics : High Reflectivity In The Range 2d = 60 to 100 Å", Proc. SPIE 0733, Soft X-Ray Optics and Technology, (1 January 1986); doi: 10.1117/12.964935; https://doi.org/10.1117/12.964935
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