6 April 1987 A High Speed, High Accuracy Lithographic Application of Argon Ion Lasers
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Proceedings Volume 0737, New Developments and Applications in Gas Lasers; (1987) https://doi.org/10.1117/12.939678
Event: OE LASE'87 and EO Imaging Symposium, 1987, Los Angeles, CA, United States
Abstract
A high performance scanning laser lithography system has been developed for high speed writing of reduction reticles (the master patterns used expose semiconductor wafers). This system uses an Argon fan laser operating at 363.8 nm as the exposing light source. An overview of the system's optics will be presented and the laser performance required to meet the system specifications will be discussed.
© (1987) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Joseph C. McMenamin, "A High Speed, High Accuracy Lithographic Application of Argon Ion Lasers", Proc. SPIE 0737, New Developments and Applications in Gas Lasers, (6 April 1987); doi: 10.1117/12.939678; https://doi.org/10.1117/12.939678
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