20 April 1987 Interferometer Accuracy And Precision
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Proceedings Volume 0749, Metrology: Figure and Finish; (1987) https://doi.org/10.1117/12.939836
Event: OE LASE'87 and EO Imaging Symposium, 1987, Los Angeles, CA, United States
This analysis examines several sources of random and systematic errors present in most interferometer systems. Optical cavity errors are typically the primary limitation on measurement accuracy. Secondary sources of error include imaging distortion, ray-mapping errors, and detector noise. When necessary, differences between phase and fringe measuring systems are addressed. The analysis is kept as generic as possible for both fringe and phase measurement, though quantitative analysis of some error sources is instrument dependent. Such analysis is directed toward the Zygo MARK interferometers and Zygo ZAPP processor. The use of reference subtraction, distortion calibration, and averaging for improving both accuracy and precision are also discussed. Ray-mapping analysis indicates practical limits on the amount of tilt, power/focus shift, and asphericity in the test piece or aberrations in the wavefront of the light source, which may be tolerated without significantly degrading measurement accuracy. The role of absolute testing techniques is also discussed.
© (1987) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Lars A. Selberg, Lars A. Selberg, "Interferometer Accuracy And Precision", Proc. SPIE 0749, Metrology: Figure and Finish, (20 April 1987); doi: 10.1117/12.939836; https://doi.org/10.1117/12.939836

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