21 August 1987 The Distribution Of Deep States In Hydrogenated Amorphous Silicon
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Proceedings Volume 0763, Physics of Amorphous Semiconductor Devices; (1987) https://doi.org/10.1117/12.940158
Event: OE LASE'87 and EO Imaging Symposium, 1987, Los Angeles, CA, United States
Abstract
The distribution of deep states in undoped a-Si:H is investigated. For this purpose, a new experimental technique is introduced which is based on the principle of thermally-stimulated space-charge relaxation. A peak in the density of states is resolved at - 0.6 eV below the mobility edge of the conduction band. The energy position and magnitude of this peak are found to be consistent with space-charge-limited current measurements.
© (1987) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Eric Snow, Eric Snow, } "The Distribution Of Deep States In Hydrogenated Amorphous Silicon", Proc. SPIE 0763, Physics of Amorphous Semiconductor Devices, (21 August 1987); doi: 10.1117/12.940158; https://doi.org/10.1117/12.940158
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