Linewidth Uniformity: A Critical Evaluation Of Spray Geometry And Process Interactions In Ultrasonic Nozzles

David DeBruin; M.Richard Hannifan; Marie Ha; Kenneth Sautter

doi:10.1117/12.940338

25 August 1987 Linewidth Uniformity: A Critical Evaluation Of Spray Geometry And Process Interactions In Ultrasonic Nozzles

David DeBruin; M.Richard Hannifan; Marie Ha; Kenneth Sautter;

Author Affiliations +

Proceedings Volume 0771, Advances in Resist Technology and Processing IV; (1987) https://doi.org/10.1117/12.940338
Event: Microlithography Conferences, 1987, Santa Clara, CA, United States

Abstract

Spatial linewidth replication is a dominant yield limiting factor for most current photolithography processes, typically consuming,/ 50% of the total linewidth variation allowance. Therefore, the reduction of across wafer variation is critical to successful process development. In this study, the primary factors affecting spatial linewidth replication were investigated. These factors include agitation uniformity, wafer rotation rate, develop temperature control, and photo-optimization. Key results are: 1. Nitrogen assisted ultrasonic spray nozzles produced a spatial linewidth standard deviation of .03 μm, compared to .05 μm for a fan spray nozzle. 2. Developer consumption for ultrasonic spray nozzles is approximately 60% less than for standard fan spray nozzles. 3. Head positioning of ultrasonic nozzles is less critical relative to fan spray nozzles for standard organic and inorganic developers. Head positioning for both ultrasonic and fan spray is critical when using high contrast MIF developers. 4. Rotation speeds of 600 - 1000 rpm were found to be optimal for both ultrasonic and fan spray. 5. Developer temperature controls parallel CD variation trends and can be minimized by use of developer temperature controllers and/or exhaust controllers. 6. Photo-optimization typically produced a 3-fold or greater improvement in linewidth uniformity across the wafer. The effect upon linewidth uniformity is demonstrated in a systematic study of the predominant variables.

Citation Download Citation

David DeBruin, M.Richard Hannifan, Marie Ha, Kenneth Sautter, "Linewidth Uniformity: A Critical Evaluation Of Spray Geometry And Process Interactions In Ultrasonic Nozzles", Proc. SPIE 0771, Advances in Resist Technology and Processing IV, (25 August 1987); doi: 10.1117/12.940338; https://doi.org/10.1117/12.940338

ACCESS THE FULL ARTICLE

PERSONAL SIGN IN
Full access may be available with your subscription

Email or Username Forgot your username?

Password Forgot your password?

Show

Remember Email/Username on this computer

Remember Password

No SPIE account? Create an account
or Institutional Sign In via Shibboleth

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available

Members: $14.40

Non-members: $18.00 ADD TO CART

Show All Keywords

Keywords/Phrases

Search In:

Publication Years