25 August 1987 New Diazoketone Dissolution Inhibitors For Deep U.V. Photolithography
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Abstract
The results of studies directed toward the design of diazoketone dissolution inhibitors for deep U.V. photolithography are described. This work has identified a useful chromophore, the 1,3-diacy1-2-diazo linkage which has the requisite spectral characteristics for use in the deep UV. Incorporation of appropriate hetero-atomes into the structure has allowed synthesis of analogs that survive common processing sequences. A detailed study of the photochemistry of these analogs led to an understanding of the importance of the stability of the ketene photoproduct on resist contrast. Imaging results are presented for a trilayer application and for excimer laser projection printing.
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C.Grant Willson, C.Grant Willson, Robert D. Miller, Robert D. Miller, Dennis R. McKean, Dennis R. McKean, Lester A. Pederson, Lester A. Pederson, } "New Diazoketone Dissolution Inhibitors For Deep U.V. Photolithography", Proc. SPIE 0771, Advances in Resist Technology and Processing IV, (25 August 1987); doi: 10.1117/12.940301; https://doi.org/10.1117/12.940301
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