25 August 1987 New Diazoketone Dissolution Inhibitors For Deep U.V. Photolithography
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The results of studies directed toward the design of diazoketone dissolution inhibitors for deep U.V. photolithography are described. This work has identified a useful chromophore, the 1,3-diacy1-2-diazo linkage which has the requisite spectral characteristics for use in the deep UV. Incorporation of appropriate hetero-atomes into the structure has allowed synthesis of analogs that survive common processing sequences. A detailed study of the photochemistry of these analogs led to an understanding of the importance of the stability of the ketene photoproduct on resist contrast. Imaging results are presented for a trilayer application and for excimer laser projection printing.
© (1987) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
C.Grant Willson, C.Grant Willson, Robert D. Miller, Robert D. Miller, Dennis R. McKean, Dennis R. McKean, Lester A. Pederson, Lester A. Pederson, "New Diazoketone Dissolution Inhibitors For Deep U.V. Photolithography", Proc. SPIE 0771, Advances in Resist Technology and Processing IV, (25 August 1987); doi: 10.1117/12.940301; https://doi.org/10.1117/12.940301


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