1 January 1987 High-Speed Reticle Qualification System
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Abstract
Wafer steppers play an important role in VLSI production. However, wafer exposure by a stepper requires both a perfect or defect-free reticle and an elaborate resist process. When a reticle is produced by mask shop its perfection or pattern integrity is guarantteed with a reticle inspection system. When introduced and used in the VLSI production, however, the reticle sometimes becomes defective due to falling particles and/or chrominum peel-off caused by inadequate reticle cleaning. Even with a pellicle, the reticle gets contaminated with dusts caused by careless handling. Therefore, the in-situ reticle inspection or reticle qualification is necessary to secure the exposure of product wafers.
© (1987) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Hirobumi Ishihara, Hirobumi Ishihara, Tokuro Sooma, Tokuro Sooma, Morio Misonoo, Morio Misonoo, Kei Takatsu, Kei Takatsu, Kiyohiko Akanuma, Kiyohiko Akanuma, } "High-Speed Reticle Qualification System", Proc. SPIE 0772, Optical Microlithography VI, (1 January 1987); doi: 10.1117/12.967057; https://doi.org/10.1117/12.967057
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