1 January 1987 New I-Line Lenses For Submicron Lithography
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Abstract
New lenses for i-line lithography will be discussed. The advantages of shorter wavelengths for achieving higher resolution with greater depth of focus are well known. While prototype i-line (365nm wavelength) lenses have been available for several years, the field sizes were too small to be useful in production. Several lenses have become available recently which offer higher resolution and/or better field size. Among these are the Tropel 1635i and 2235i lenses, 5X lenses with numerical aperture of 0.35 and resolution of 0.8um. Field sizes are 16 and 22mm. Experimental data on resolution, depth of focus, CD control and image placement errors will be presented. In addition, several i-line resist processes will be discussed from the standpoint of optimum resolution with single layer processing.
© (1987) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Setha G. Olson, Setha G. Olson, } "New I-Line Lenses For Submicron Lithography", Proc. SPIE 0772, Optical Microlithography VI, (1 January 1987); doi: 10.1117/12.967032; https://doi.org/10.1117/12.967032
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