Photomask Protection Using Glass Coverplates

Terrence E. Zavecz; Edward L. Banks

doi:10.1117/12.967054

1 January 1987 Photomask Protection Using Glass Coverplates

Terrence E. Zavecz, Edward L. Banks

Proceedings Volume 0772, Optical Microlithography VI; (1987) https://doi.org/10.1117/12.967054
Event: Microlithography Conferences, 1987, Santa Clara, CA, United States

Abstract

The physical concepts and yield advantages of pellicle protected masks have been reported in many papers. Pellicle disadvantages such as fragility and the hazard of particles trapped under the membrane have been greatly outweighed by the observed chip yield increase. Yet the pellicle provides no protection against static discharge, the dislodgement of previously electrostatically fixed particles, pellicle degradation and surface etch faults.

Citation Download Citation

Terrence E. Zavecz and Edward L. Banks "Photomask Protection Using Glass Coverplates", Proc. SPIE 0772, Optical Microlithography VI, (1 January 1987); https://doi.org/10.1117/12.967054

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