1 January 1987 Ring-Field Vs Full-Field Projection Systems: An Optical Performance Comparison
Author Affiliations +
Abstract
Full-field (e.g., steppers) and ring-field (e.g., scanners) systems can be expected to differ in resolution, depth of focus, and exposure latitude as a result of their optical and opto-mechanical designs. In this study we compare the results of performance simulation of two exploratory optical systems, both having the same nominal resolution. Working values of resolution and depth of focus are determined based on the approach of B.J. Lin. The impact of wafer unflatness on the focus budget is assessed by measurement of a batch of six-inch wafers. Various focusing algorithms are simulated, leading to a measure of the reduction in focal tolerance due to wafer unflatness for both ring- and full-field systems.
© (1987) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Subhash Chandra, Subhash Chandra, Frederick Y. Wu, Frederick Y. Wu, } "Ring-Field Vs Full-Field Projection Systems: An Optical Performance Comparison", Proc. SPIE 0772, Optical Microlithography VI, (1 January 1987); doi: 10.1117/12.967037; https://doi.org/10.1117/12.967037
PROCEEDINGS
6 PAGES


SHARE
RELATED CONTENT

New 5X i-Line Projection Aligner For VLSI Fabrication
Proceedings of SPIE (January 01 1988)
Novel OPC flow for the trim-mask lithography
Proceedings of SPIE (June 29 2012)
Challenge to 0.13-um device patterning using KrF
Proceedings of SPIE (July 26 1999)
Overlay Tolerances For Vlsi Using Wafer Steppers
Proceedings of SPIE (January 01 1988)

Back to Top