30 June 1987 Advances In Focused-Ion-Beam Repair Techniques
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Abstract
The use of focused-ion-beam (FIB) technology for the repair of masks and for the modification of integrated circuits is discussed. The processes required for these two applications are similar and can thus be implemented by similar systems. Focused-ion-beam sputtering and focused-ion-beam induced deposition results are presented which show the usefulness of FIB techniques for repair applications.
© (1987) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Nicholas P. Economou, Nicholas P. Economou, David C. Shaver, David C. Shaver, Bill Ward, Bill Ward, } "Advances In Focused-Ion-Beam Repair Techniques", Proc. SPIE 0773, Electron-Beam, X-Ray, and Ion-Beam Lithographies VI, (30 June 1987); doi: 10.1117/12.940372; https://doi.org/10.1117/12.940372
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