High Throughput And Accuracy X-Ray Stepper With Plasma Source

A. Une; M. Suzuki; I. Okada; Y. Saitoh; H. Yoshihara

doi:10.1117/12.940352

30 June 1987 High Throughput And Accuracy X-Ray Stepper With Plasma Source

A. Une, M. Suzuki, I. Okada, Y. Saitoh, H. Yoshihara

Proceedings Volume 0773, Electron-Beam, X-Ray, and Ion-Beam Lithographies VI; (1987) https://doi.org/10.1117/12.940352
Event: Microlithography Conferences, 1987, Santa Clara, CA, United States

Abstract

For the replication of submicron patterns with high throughput and high overlay accuracy, an x-ray stepper with a plasma source has been developed. The maintenance interval of the gas-puff z-pinch plasma source is 100 times better than that of the previous plasma source. The improvement is achieved by reducing electrode consumption and devising a new plasma remover. A single grating and double-pitch dual grating technique has been developed to align wafer to mask. The gap and lateral displacement between mask and wafer are detected by utilizing +1st-order diffraction light intensities. Their detection resolutions are less than 0.01pm. By combining this detection system with the conventional stages, an absolute gap accuracy of ±0.3μm and a lateral alignment servo accuracy of ±0.02μm have been achieved. Using this new x-ray stepper with the plasma source, a 0.3pm pattern has been replicated accurately in a maximum field of 30x3Omm at a throughput of 20 wafers per hour.

Citation Download Citation

A. Une, M. Suzuki, I. Okada, Y. Saitoh, and H. Yoshihara "High Throughput And Accuracy X-Ray Stepper With Plasma Source", Proc. SPIE 0773, Electron-Beam, X-Ray, and Ion-Beam Lithographies VI, (30 June 1987); https://doi.org/10.1117/12.940352

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