30 June 1987 Laser Plasma X-Ray Source For Lithography
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Intense soft x-ray generation in 1.05, 0.53, 0.26μm laser-produced plasmas has been investigated for the photon energies of 0.15 to 3keV. X-ray spectra and conversion efficiency are obtained as a function of atomic number. We find a parameter range of the target and laser conditions which allows us to achieve an adequate throughput of the exposure for x-ray lithography. X-ray lithography experiments using laser plasma x ray are presented. The facility consisting of a laser system and several exposure stations is proposed. Finally we propose the use of liquid or solid cryogenic targets of xenon or krypton to avoid the deposition of the target material. A preliminary experimental result and target schemes are presented.
© (1987) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
T. Mochizuki, T. Mochizuki, R. Kodama, R. Kodama, C. Yamanaka, C. Yamanaka, H. Aritome, H. Aritome, } "Laser Plasma X-Ray Source For Lithography", Proc. SPIE 0773, Electron-Beam, X-Ray, and Ion-Beam Lithographies VI, (30 June 1987); doi: 10.1117/12.940378; https://doi.org/10.1117/12.940378


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