1 September 1987 Advances In Excimer Laser Lithography
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Proceedings Volume 0774, Lasers in Microlithography; (1987); doi: 10.1117/12.940396
Event: Microlithography Conferences, 1987, Santa Clara, CA, United States
Abstract
This paper reviews the rapidly emerging field of excimer laser lithography. Beginning with the first sub-micron exposures, developments in excimer laser projection printing on various commercial lithographic machines are reviewed. Recent results obtained with full-field scanning projection systems as well as step-and-repeat tools are summarized. Future directions in optical lithography are examined in view of these advances. Finally, a discussion of various key excimer laser parameters is presented from two points of view: availability, and requirements for various practical lithographic systems.
© (1987) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Kanti Jain, "Advances In Excimer Laser Lithography", Proc. SPIE 0774, Lasers in Microlithography, (1 September 1987); doi: 10.1117/12.940396; https://doi.org/10.1117/12.940396
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KEYWORDS
Excimer lasers

Lithography

Optical lithography

Semiconducting wafers

Photomasks

Printing

Deep ultraviolet

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