Photoetching with excimer lasers has been studied in a variety of polymeric materials. Photoetching rates of polymers irradiated were measured at various laser wavelengths and fluences. The relationship of these results to the polymer absorption coefficient is examined. We propose that different mechanisms of photoetching may prevail, which depend on the absorption coefficient of the polymer. Potential use of this dry-etching process for lithography applications is evaluated.
Y. S. Liu,
H. S. Cole,
H. R. Philipp,
"Photoetching Of Polymers With Excimer Lasers", Proc. SPIE 0774, Lasers in Microlithography, (1 September 1987); doi: 10.1117/12.940398; https://doi.org/10.1117/12.940398