17 April 1987 A High Resolution Dimensional Metrology System For Masks
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Abstract
The continuous advance of microlithographic fabrication techniques into the submicron structure range requires a new generation of metrology systems to measure with an accuracy and throughput necessary for the demands of VLSI technology.
© (1987) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
H. Becker, H. Becker, D. Elliott, D. Elliott, W. Hunn, W. Hunn, } "A High Resolution Dimensional Metrology System For Masks", Proc. SPIE 0775, Integrated Circuit Metrology, Inspection, & Process Control, (17 April 1987); doi: 10.1117/12.940418; https://doi.org/10.1117/12.940418
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