17 April 1987 Applications Of A High-Speed, High-Resolution Metrology System
Author Affiliations +
Proceedings Volume 0775, Integrated Circuit Metrology, Inspection, & Process Control; (1987); doi: 10.1117/12.940426
Event: Microlithography Conferences, 1987, Santa Clara, CA, United States
Abstract
It has been well established by previous work that high resolution electron-beam imaging is required to accurately measure dimensions near a micron and below. A brief overview of the applications for micrometrology system indicates that speed of operation or thruput is very important. A recently developed system is described which has been specifically designed for low voltage, high-speed micrometrology.
© (1987) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
KarI L. Harris, Sakae Miyauchi, Takao Namae, "Applications Of A High-Speed, High-Resolution Metrology System", Proc. SPIE 0775, Integrated Circuit Metrology, Inspection, & Process Control, (17 April 1987); doi: 10.1117/12.940426; http://dx.doi.org/10.1117/12.940426
PROCEEDINGS
14 PAGES


SHARE
KEYWORDS
Semiconducting wafers

Metrology

Inspection

Process control

Integrated circuits

Image registration

Error analysis

RELATED CONTENT


Back to Top