Microscop.Yap.Piied To Cirs,Registration And Inspection

D. Yansen; J. Sardella; F. Madison; P. Knutrud

doi:10.1117/12.940419

17 April 1987 Microscop.Yap.Piied To Cirs,Registration And Inspection

D. Yansen, J. Sardella, F. Madison, P. Knutrud

Proceedings Volume 0775, Integrated Circuit Metrology, Inspection, & Process Control; (1987) https://doi.org/10.1117/12.940419
Event: Microlithography Conferences, 1987, Santa Clara, CA, United States

Abstract

Realtime digital image processing of highly magnified optical images - Digital Microscopy - provides the basis for dramatic improvements in the rapid and repeatable acquisition of key process control information - CD's, registration, defect data. Metrology: Wafer and mask features down to .25u can now be repeatably measured optically. Techniques used in extending the minimum optical width measurement from ~l-1.5ji to .25|i will be discussed. Registration: Mask to wafer registration and layer to layer registration can now be measured with a standard deviation of .0033ji using box within a box or similar patterns. Inspection: High speed comparison to "golden" images stored in memory gives a quick look capability in addition to more extensive defect detection and coordinate determination capability. A variety of image processing functions will be discussed.

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D. Yansen, J. Sardella, F. Madison, and P. Knutrud "Microscop.Yap.Piied To Cirs,Registration And Inspection", Proc. SPIE 0775, Integrated Circuit Metrology, Inspection, & Process Control, (17 April 1987); https://doi.org/10.1117/12.940419

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