17 April 1987 Use Of Expert Systems In Photolithography
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Abstract
Expert systems for photolithography or photolithography-related domains are being built by many semiconductor chip manufacturers, fabrication equipment manufacturers, and university groups. This paper describes several such applications for process control, diagnosis, automation, design, simulation, planning, and scheduling. Benefits and implementation issues are highlighted.
© (1987) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Wendy Fong, Terry B. Cline, "Use Of Expert Systems In Photolithography", Proc. SPIE 0775, Integrated Circuit Metrology, Inspection, & Process Control, (17 April 1987); doi: 10.1117/12.940438; https://doi.org/10.1117/12.940438
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