17 April 1987 Use Of Expert Systems In Photolithography
Author Affiliations +
Proceedings Volume 0775, Integrated Circuit Metrology, Inspection, & Process Control; (1987); doi: 10.1117/12.940438
Event: Microlithography Conferences, 1987, Santa Clara, CA, United States
Abstract
Expert systems for photolithography or photolithography-related domains are being built by many semiconductor chip manufacturers, fabrication equipment manufacturers, and university groups. This paper describes several such applications for process control, diagnosis, automation, design, simulation, planning, and scheduling. Benefits and implementation issues are highlighted.
© (1987) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Wendy Fong, Terry B. Cline, "Use Of Expert Systems In Photolithography", Proc. SPIE 0775, Integrated Circuit Metrology, Inspection, & Process Control, (17 April 1987); doi: 10.1117/12.940438; https://doi.org/10.1117/12.940438
PROCEEDINGS
8 PAGES


SHARE
KEYWORDS
Optical lithography

Diagnostics

Process control

Manufacturing

Inspection

Process engineering

Computing systems

Back to Top