In the fully automated semiconductor integrated circuit fabrication facility of the future, individual fabrication processes are expected to be controlled, on-line, by intelligent systems. These systems will adjust process parameters based on a given process specification. The current state of a process will be supplied to these systems in part by intelligent sensors/inspection systems which will observe the product after it has been processed. These systems should be fast, nondestructive, automatic, and be able to work at high resolutions. For monitoring the etching and microlithography processes, a system that can extract integrated circuit pattern (sidewall) topography will be very useful. This paper presents our work on using automatic stereo, with scanning electron microscope (SEM) secondary electron images as input, for extracting integrated circuit pattern topography. In this paper following an introduction to the concept of shape from computer stereo vision, an algorithm that has been developed for this task will be discussed. The parallel implementation of this algorithm on an NCUBE multiprocessor will be discussed next. This will be followed by a presentation of results.