22 September 1987 Invited Paper Laser-Induced Surface Modification And Chemical Etching Of Materials
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Proceedings Volume 0801, High Power Lasers: Sources, Laser-Material Interactions, High Excitations, and Fast Dynamics; (1987) https://doi.org/10.1117/12.941236
Event: Fourth International Symposium on Optical and Optoelectronic Applied Sciences and Engineering, 1987, The Hague, Netherlands
Abstract
Laser-induced surface modification and chemical etching of insulators, semiconductors and metals is reviewed. Special emphasis is placed on new results concerning the metallization and the etching of piezoelectric oxides and the etching of silicon with chlorine.
© (1987) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
M. Eyett, M. Eyett, R. Kullmer, R. Kullmer, D. Bauerle, D. Bauerle, } "Invited Paper Laser-Induced Surface Modification And Chemical Etching Of Materials", Proc. SPIE 0801, High Power Lasers: Sources, Laser-Material Interactions, High Excitations, and Fast Dynamics, (22 September 1987); doi: 10.1117/12.941236; https://doi.org/10.1117/12.941236
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