14 October 1987 Recent Developments In Electron Beam Lithography
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Proceedings Volume 0804, Advances in Image Processing; (1987) https://doi.org/10.1117/12.941289
Event: Fourth International Symposium on Optical and Optoelectronic Applied Sciences and Engineering, 1987, The Hague, Netherlands
Abstract
Electron beam pattern generators are nowadays used extensively for the production of masks and for direct writing on wafers. For obvious reasons electron beam pattern generators are optimized for integrated circuit fabrication. However there is also considerable potential for the use of electron beam lithography in other areas. In this paper recent trends in the development of electron beam pattern generators are described and the prob-lems encountered in the application of electron beam machines in other areas e.g. integrated optics are discussed.
© (1987) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
S. Radelaar, S. Radelaar, } "Recent Developments In Electron Beam Lithography", Proc. SPIE 0804, Advances in Image Processing, (14 October 1987); doi: 10.1117/12.941289; https://doi.org/10.1117/12.941289
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