Electron beam pattern generators are nowadays used extensively for the production of masks and for direct writing on wafers. For obvious reasons electron beam pattern genera-tors are optimized for integrated circuit fabrication. However there'is also considerable potential for the use of electron beam lithography in other areas. In this paper recent trends in the development of electron beam pattern generators are described and the problems encountered in the application of electron beam machines in other areas e.g. integrated optics are discussed.
"Recent Developments In Electron Beam Lithography", Proc. SPIE 0807, Passive Infrared Systems and Technology, (10 September 1987); doi: 10.1117/12.941429; https://doi.org/10.1117/12.941429