Recent Developments In Electron Beam Lithography

S. Radelaar

doi:10.1117/12.941516

18 September 1987 Recent Developments In Electron Beam Lithography

S. Radelaar

Proceedings Volume 0810, Optical Systems for Space Applications; (1987) https://doi.org/10.1117/12.941516
Event: Fourth International Symposium on Optical and Optoelectronic Applied Sciences and Engineering, 1987, The Hague, Netherlands

Abstract

Electron beam pattern generators are nowadays used extensively for the production of masks and for direct writing on wafers. For obvious reasons electron beam pattern generators are optimized for integrated circuit fabrication. However there is also considerable potential for the use of electron beam lithography in other areas. In this paper recent trends in the development of electron beam pattern generators are described and the problems encountered in the application of electron beam machines in other areas e.g. integrat-ed optics are discussed.

Citation Download Citation

S. Radelaar "Recent Developments In Electron Beam Lithography", Proc. SPIE 0810, Optical Systems for Space Applications, (18 September 1987); https://doi.org/10.1117/12.941516

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