17 September 1987 Advances In 1:1 Optical Lithography
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Proceedings Volume 0811, Optical Microlithographic Technology for Integrated Circuit Fabrication and Inspection; (1987) https://doi.org/10.1117/12.975606
Event: Fourth International Symposium on Optical and Optoelectronic Applied Sciences and Engineering, 1987, The Hague, Netherlands
Abstract
Numerous advancements based on the inherent simplicity and excellent optical correction of 1:1 broadband stepper lenses have occurred over the past year. This paper briefly touches on the lithographic requirements of various segments of the semiconductor industry and describes photolithographic developments that meet many of these requirements.
© (1987) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Adonis C. Stephanakis, Adonis C. Stephanakis, Daniel I. Rubin, Daniel I. Rubin, Ron Voisin, Ron Voisin, } "Advances In 1:1 Optical Lithography", Proc. SPIE 0811, Optical Microlithographic Technology for Integrated Circuit Fabrication and Inspection, (17 September 1987); doi: 10.1117/12.975606; https://doi.org/10.1117/12.975606
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